Tool Optimization for Dry Forming Applications - Optimized Surface Preparation of ta-C

Abstract

Within this work, the development of roughness during vacuum arc deposition of ta-C thin films was investigated. By means of topography measurements of the plasma etching processes, adhesion layer- and ta-C deposition were investigated. These investigations were made for two materials tool steel 1.2379 and a stainless steel 1.4301 as well as different probe roughness. Material dependent differences in the ablation depth during the metal-ion-sputtering process are investigated. Furthermore the roughness of the samples after the deposition of a chromium adhesion layer is analyzed. From these investigations conclusions concerning an optimized probe roughness prior to the deposition can be made. Additionally the thin film preparation process and the pretreatment processes can be tuned for improved tribological coatings.