Tool Optimization for Dry Forming Applications - Optimized Surface Preparation of ta-C
Veröffentlichungsdatum
2017
Autoren
Herausgeber
Zusammenfassung
Within this work, the development of roughness during vacuum arc deposition of ta-C thin films was investigated. By means of topography measurements of the plasma etching processes, adhesion layer- and ta-C deposition were investigated. These investigations were made for two materials tool steel 1.2379 and a stainless steel 1.4301 as well as different probe roughness. Material dependent differences in the ablation depth during the metal-ion-sputtering process are investigated. Furthermore the roughness of the samples after the deposition of a chromium adhesion layer is analyzed. From these investigations conclusions concerning an optimized probe roughness prior to the deposition can be made. Additionally the thin film preparation process and the pretreatment processes can be tuned for improved tribological coatings.
Schlagwörter
PVD
;
etching
;
chromium
;
ta-C coating
Institution
Dokumenttyp
Artikel/Aufsatz
Zeitschrift/Sammelwerk
Band
Volume 3
Startseite
25
Endseite
29
Zweitveröffentlichung
Nein
Sprache
Deutsch
Dateien![Vorschaubild]()
Lade...
Name
00105724-1.pdf
Size
588.19 KB
Format
Adobe PDF
Checksum
(MD5):873164543e33f1578a80b81152a2c416