Logo des Repositoriums
Zur Startseite
  • English
  • Deutsch
Anmelden
  1. Startseite
  2. SuUB
  3. Forschungsdokumente
  4. CVD diamond coating of forming dies with a homogenous coating thickness
 
Zitierlink URN
https://nbn-resolving.de/urn:nbn:de:gbv:46-00107809-18

CVD diamond coating of forming dies with a homogenous coating thickness

Veröffentlichungsdatum
2019
Autoren
Prieske, Markus  
Herausgeber
Vollertsen, Frank  
Zusammenfassung
Ball-on-plate tribometer tests have already shown that polished polycrystalline CVD diamond coatings in dry tribological contact with aluminium lead to low wear rates and a low coefficient of friction of 0.12. The possibility to coat the forming zone of forming dies was investigated in this study to evaluate the applicability of CVD diamond coatings for a tapering process of aluminium rods. The results are examined by laser-scanning confocal microscopy, scanning electron microscopy and cryofractures. CTF12D carbide grade dies with a height of 5 mm and an inner diameter of 7.8 mm could be coated with a laser-based plasma CVD process with a CVD diamond coating with a homogeneous thickness of 2.3 microm. The standard deviation of the coating thickness variation is only 0.1 microm in the entire forming zone. This was achieved by combining an etching process, a masked diamond nucleation, a specially fabricated rotating substrate holder and turning the die upside down after half the coating time so that the plasma flame enters through the other opening of the die.
Schlagwörter
CVD diamond deposition

; 

hard metal

; 

forming die
Institution
Universität Bremen  
Fachbereich
Fachbereich 04: Produktionstechnik, Maschinenbau & Verfahrenstechnik (FB 04)  
Dokumenttyp
Artikel/Aufsatz
Zeitschrift/Sammelwerk
Dry Metal Forming Open Access Journal  
Band
5
Heft
5
Startseite
09
09
Endseite
12
12
Zweitveröffentlichung
Nein
Sprache
Deutsch
Dateien
Lade...
Vorschaubild
Name

00107809-1.pdf

Size

1.08 MB

Format

Adobe PDF

Checksum

(MD5):3b971755a79361f5513eb1a7eebcaa34

Built with DSpace-CRIS software - Extension maintained and optimized by 4Science

  • Datenschutzbestimmungen
  • Endnutzervereinbarung
  • Feedback schicken