Analyse struktureller Eigenschaften von GaN mittels hochauflösender Röntgenbeugung bei variabler Meßtemperatur
Veröffentlichungsdatum
2007-02-26
Autoren
Betreuer
Gutachter
Zusammenfassung
The objective of this work is the investigation of the strain and the stress in GaN-based semiconductor layers by high-resolution x-ray diffraction (HRXRD) at variable temperatures. Due to the lack of native substrates GaN-based layers are typically grown on foreign substrates, which results in strained layers with a complex strain configuration. Moreover, heterostructures of group-III nitrides grown along the [0001] direction suffer from strong polarization fields perpendicular to their interfaces, which are undesirable for light-emitting devices whose active regions consist of quantum wells. Therefore, group-III nitride layers have been recently grown on non-polar planes, such as the a-plane. To account for the various questions regarding strain and stress in group-III-nitrides, the spectrum of different GaN layers, which were studied in this thesis, spans from bulk-like free-standing layers over thick c-plane layers to laterally overgrown structures and non-polar a-plane layers.
Schlagwörter
GaN
;
x-ray diffraction
;
strain
;
stress
;
HVPE
;
a-plane
;
non-polar
;
Cantilever
;
thermal expansion
Institution
Fachbereich
Dokumenttyp
Dissertation
Zweitveröffentlichung
Nein
Sprache
Deutsch
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00010670.pdf
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9.12 MB
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